The proceedings of the International Conference on [title] held in Elenite, Bulgaria, September 1990, cover ion implantation in semiconductors device applications; ion implantation in compound semiconductors; implantation-induced damage; annealing of defects in semiconductors; ion source technology and beam transport; ion implantation in metals, ceramics, and insulators; ion beam assisted deposition, ion beam mixing, sputtering; and materials analysis using ion beams. No index. Acidic paper. Annotation copyright Book News, Inc. Portland, Or.
